Abstract
This note describes a new reactor design for continuous synthesis of vertically oriented graphene (VG) sheets on cylindrical wire substrates using an atmospheric plasma-enhanced chemical vapor deposition (PECVD) system. Through combining a U-shaped reactor design with "dynamic mode" synthesis featuring simultaneous rotational and axial movements of the metallic wire substrate, the new setup can enable continuous synthesis of VG sheets on the wire surface with remarkable uniformity in both circumferential and axial directions. In contrast, synthesis of VG at "static mode" with a fixed substrate can only lead to non-uniform growth of VG sheets on the wire surface. Potential applications of the resulting uniform-VG-coated metallic wire could include field emitters, field-ionization-based neutral atom detectors, and indoor corona discharges.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
