Abstract
AbstractNearly normally‐off operation of the GaN‐based heterojunction field effect transistors was obtained using AlGaN/GaN/AlGaN double heterojunction channel. The aluminum compositions of the AlGaN heterobarriers are designed so as to deplete the electron carrier in the AlGaN/GaN/AlGaN channel, which gives the threshold gate voltage of about 0 V. The maximum drain current density was over 170 mA/mm. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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