Abstract
We report a novel field-sensitive tunneling barrier by embedding C60 in SiO2 for nonvolatile memory applications. C60 is a better choice than ultrasmall nanocrystals due to its monodispersion. Moreover, C60 provides accessible energy levels to prompt resonant tunneling through SiO2 at high fields. However, this process is quenched at low fields due to highest occupied molecular orbital (HOMO)-lowest unoccupied molecular orbital (LUMO) gap and large charging energy of C60. Furthermore, we demonstrate an improvement of more than an order of magnitude in retention to program/erase time ratio for a metal nanocrystal memory. This shows promise of engineering tunnel dielectrics by integrating molecules in the future hybrid molecular-silicon electronics.
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