Abstract
Nonuniform depolarization properties of ${\text{SiO}_2}$SiO2 thin film, two-dimensional (2D) Si grating, and three-dimensional Si cylinder grating, were systematically investigated by Lu-Chipman decomposition. We find that introducing surface profiles with dimensions comparable to the detecting wavelengths can lead to obvious nonuniform depolarization, and control of the sample azimuth can manipulate the uniformity of the depolarizer components. The results indicate that the 2D nanostructure shows obvious nonuniform depolarization at 0° and 90° azimuths, while almost uniform depolarization at 45° azimuth. These discovered phenomena may give rise to some potential applications, such as the detection of the existence of nanostructures without a priori information about the sample, and the design of a uniform or nonuniform depolarizer.
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