Nonlinear thermo-elastic analysis of edge dislocations with Internal Heat Generation in Semiconductor Materials

Abstract

In this work, the nonlinear thermo-elastic analysis of edge dislocations with internal heat generation is performed by the extended finite element method (XFEM) in semiconductor materials. The nonlinearity due to the temperature dependent electrical conductivity, thermal conductivity and thermal expansion coefficient is examined. The presence of an electric field in the direction of the dislocation line results in internal heat generation due to the electrical resistivity. The continuous Volterra model of dislocation is used for XFEM analysis of dislocations. The influence of Joule heat on thermal and elastic fields is observed. Different temperatures and electric field intensity values are taken for understanding the dislocation behavior. The Peach-Koehler (P–K) force for different dislocation configurations such as dislocation-dislocation interaction, dislocation-free surface interaction and dislocation-material interface interaction is evaluated. The results are found quite different with the amount of heat generation. The P–K force values are found more than that of pure elastic case. With the knowledge of the movability function, the obtained results can be used to predict the velocity of the dislocations.