Nonlinear optical polymer patterned by nanoimprint lithography as a photonic crystal waveguide structure

Abstract

A photonic crystal (PC) waveguide structure has been imprinted onto a nonlinear optical (NLO) polymer using thermal nanoimprint lithography (NIL). The imprint characteristics of Disperse Red 1 doped poly(methylmethacrylate) as the NLO polymer are evaluated by atomic force microscope. A waveguide structure with a uniform height of 650nm is obtained at an imprint temperature of 120°C. A peeling problem at the interfaces between constructing layers is solved by preparation of an appropriate substrate structure. Finally, polarized reflectivity measurement was performed for the imprinted PC waveguide structure. Several sharp dips corresponding to the formation of photonic band dispersion are observed. It was demonstrated that NIL is a direct path to the precise patterning of PC waveguide structures.