Abstract
In the molecular-beam epitaxy (MBE) process precise control over thickness, composition, and doping profiles are critical for end device performance. This paper addresses the problem of accurately controlling the flux sources (effusion cells) used in MBE. We present a nonlinear compensator based on exact input-output linearization via feedback to control the flux of an effusion cell. The unmeasured states, necessary for implementation of the controller, are estimated by a Kalman-Bucy observer. We present simulations of the composite observer/nonlinear controller system, showing successful flux command following and elimination of shutter induced flux transients.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
