Abstract
The capability of THz-time domain spectroscopy (TDS) for the non-invasive extraction of the conductive properties of metal and semiconductor surfaces is essential for advancements in material science and device analysis. Here, we demonstrate that this technique can be successfully applied to image and analyze sub-diffraction inhomogeneities using THz near-field microscopy. Additionally, a novel total internal reflection geometry enables time-resolved THz time-domain near-field microscopy using ultrashort optical pulses on photoexcited semiconducting materials with a resolution of $< 50~\mu {\mathrm{ m}}$.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
