Abstract
Oxygen radicals (ORs) are highly efficient for in situ cleaning of organic contaminants from the interior of vacuum systems and sample surfaces [1]. ORs decompose organics into gasses (H2O, CO, CO2), which are evacuated from the system. This phenomenon has been used to devise surface cleaning methods for a diverse range of materials. However, the application of OR cleaning to graphite and carbon nanotubes (CNTs) is not straightforward, as O plasma is known to ash both forms of carbon. This work [2] demonstrates a successful OR cleaning of surface organic contaminants (most likely hydrocarbons from the air), as well as chemical residue from the fabrication process, without inducing microstructural changes visible by SEM.
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