Abstract
We demonstrate a nondestructive millimeter-wave surface imaging technique using a near-field scanning millimeter-wave microscope (NSMM) with a resonant standard waveguide probe at an operation frequency f = 30 – 39 GHz . A chemically etched metallic probe tip, was coupled to the resonant rectangular waveguide. By properly tuning the tunable resonator and the probe tip, we could improve sensitivity and spatial resolution of the NSMM. Measuring the change of the reflection coefficient S 11 in the near-field zone, sheet resistance changes of Ag, ITO, YBa 2Cu 3O y , organic copper(II) phthalocyanine (Cu–Pc) thin films, and MgO were obtained. We observed the NSMM images of Ag thin film on the glass substrate with a spatial resolution better than 2 μm.
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