Abstract
A multi-wavelength, micro Raman spectroscopy system was designed and used for non-contact and non-destructive thickness and Ge content characterization of Si1-xGex/Si. The thickness and Ge content estimated by Raman measurements were compared to those values obtained from X-ray diffraction (XRD) and X-ray reflectance (XRR) measurements for cross-reference and showed very good agreement. The multi-wavelength excitation capability of the Raman system allows non-contact and non-destructive probing of Ge concentration as well as Si stress in Si1-xGex/Si along the depth direction. The Ge concentration gradient of small size test pads (as small as 10μm x 10μm) in depth direction were successfully measured using the multi-wavelength Raman system. The multi-wavelength Raman system with high spectral and spatial resolution is found to be very attractive and powerful for characterizing advanced semiconductor materials, such as Si1-xGex/Si and strained Si. It is also very useful for monitoring and controlling process equipment and process conditions.
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