Abstract
Non-linear effects on Ti emission during TiN synthesis in an inductively coupled plasma assisted DC magnetron sputtering system have been investigated. TiN films are deposited on stainless steel 304 substrates, using N 2 + Ar mixture in the absence and presence of RF current variation. In-situ measurements of the optical emission collected during the deposition processes indicate differences in the intensities of the Ti species involved. Film characterizations indicate that such plasma non-linearity plays a pivotal role in the eventual film properties. Highly orientated (111) TiN films deposited under the same RF power were found to correspond to two different hardness values, one being 2240Hv and is 40% harder than the other.
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