Abstract
Macrokinetic features and mechanism of Mo-Si reaction in conditions of rapid heating on a single particle level (Mo/Si diffusion couple) were studied by high-speed scanning electrothermography. The experiments were conducted in the temperature-time conditions (T = 1000–1600°C, t = 0.01–3.0 s) comparable to those of combustion synthesis of molybdenum disilicide. The rates of chemical heat release (depending on the thickness of silicon layer, δSi) were measured and the processes of phase/structure formation were explored. Over a wide range of δSi, two-stage chemical heat release was associated with occurrence of solid-solid Mo(s) + Si(s) (for T TmpSi), where TmpSi stands for the melting point of Si. Proposed was a new mechanism for siliconization of Mo in non-isothermal conditions.
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