Non-destructive initial-profile-free depth profile evaluation of thin-film sample using angle-resolved X-ray photoelectron spectroscopy and profile smoothing regularization

Abstract

A new data analysis method that offers a non-destructive evaluation of the depth profile of the sample from the angle-resolved X-ray photoelectron spectroscopy data is demonstrated. The analysis method is based on the smoothing of the depth profile and is constructed by a simple equation compared to conventional methods. It does not require pre-existing information about the profile. The unnecessity is convenient in many scenes in material science. Details of the theory, including the techniques to omit the necessity of the initial value in the analysis process, are explained. The new method has been applied to SiN thin film samples to show that the reasonable depth profile can be actually obtained without pre-existing information about the depth profile.