NO and SO 2 removal in non-thermal plasma reactor packed with glass beads-TiO 2 thin film coated by PCVD process

Abstract

We analyzed the NO and SO 2 removal in the non-thermal plasma discharge process combined with TiO 2 photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO 2 thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO 2 removal efficiencies obtained in non-thermal plasma–TiO 2 photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO 2 by photocatalysts. The NO and SO 2 removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO 2 concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO 2.