Abstract
N2+ ions were implanted into specimens of commercially supplied pure titanium at 1.5 MeV with different doses ranging from 5×1020 to 2×1021 ions per m2, and the oxidation behavior of specimens was investigated in air and water vapor at 823 K and 1073 K.The mass gain of the specimen increases with increasing holding time and it is much larger in water vapor than in air. The mass gain of the implanted specimen is less than that of unimplanted specimen in both environments, and the amount of oxidation decreases with increasing implantation doses. According to X-ray diffraction analysis, TiH2 is detected in the substrate after oxidation in water vapor. The X-ray analysis and the microscopic observation of cross section indicate that the oxidation in water vapor occurs from the interface between the oxidation film and the substrate by the inner transfer of water vapor. The reason for the reduction of oxidation by N2+ ion implantation can be that the Ti2N or TiN precipitates decrease the effective surface area for oxide formation and the soluted nitrogen atoms prevent the ingress of oxygen atoms into the surface region.
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