Abstract
Plasma source ion implantation over a period of 30 min, with actual ion implantation times of ∼15 s, has been studied. Estimates of steady-state heat diffusion indicate bulk average temperatures of <50 °C. Experimental profiles show nitrogen diffusion up to ≳1 μm, indicating surface temperatures of ∼500 °C. Resultant implantation and diffusion profiles are compared with conventional plasma nitrided samples.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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