Abstract
Titanium nitride and carbonitride films were formed by evaporating titanium while simultaneously irradiating with energetic nitrogen ions in an atmosphere of N2 and C2H2+N2, respectively. The physical and chemical properties, such as composition, purity, hardness, adhesion and corrosion resistance behaviour, were examined with respect to the process parameters such as nitrogen ion current density and the process pressure of the reactive gases. Nitride and carbonitride phases can be obtained over a wide range of process parameters. Oxygen contamination strongly depends on the ion current density. Deposits of TiN were prepared with hardness values of up to 2800 kgmm−2 and adhesion values of up to 15 N critical load in the scratch test. For TiCN the values were 4000 kgmm−2 and 10 N. Even a thin layer of only 1 μm of either TiN or TiCN reduced the corrosion rate of stainless steel in sea water by about an order of magnitude over a period of one month.
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