Abstract

Aromatic diols play a pivotal role in various industries as crucial components of bulk feedstock and fine chemicals, particularly in pharmaceutical production. However, the complexity of the chemical reactions involved in their synthesis often poses challenges for achieving high yields and purity. This study introduces an alternative approach for the synthesis of 2,3-diphenylbutane-2,3-diol (DPB) and 2-phenylbutane-2,3-diol (PB) using niobium oxides as photocatalysts for C–C reductive coupling with acetophenone as the substrate. Niobium oxides were synthesized from commercially available niobic acid (HY-340) via calcination at various temperatures. The characterization data revealed the critical impact of thermal treatment on the acid-hydroxylated surface groups of niobic acid, which strongly influenced the photocatalytic performance. Therefore, niobic acid emerged as the most active photocatalyst, achieving yields of 32.0 % and 35.1 % for PB and DPB, respectively, after 2 h of UV irradiation. Control experiments were conducted in conjunction with electron paramagnetic resonance and electrochemical impedance measurements to elucidate the mechanistic pathways governing the formation of DPB and PB, and to shed light on the significant role played by the surface structure of niobic acid in influencing the photocatalytic performance. This study not only provides valuable insights into the synthesis of aromatic diols but also emphasizes the significance of tailoring the surface properties of niobium oxide catalysts to enhance reactivity in photochemical processes.

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