Abstract
Thin films of Nb doped SrTiOx (Nb-STO) have been fabricated on x (100) substrates by the pulsed laser deposition (PLD) technique. The effect of the oxygen pressure and the substrate temperature on film properties such as surface roughness, lattice constants and film compositions has been investigated. The preferential orientation of Nb-STO films was a-axis at the substrate temperature of 400°C∼700°C and at the oxygen pressures lower than 3 × 10-1Torr. At the low oxygen pressure, the Nb-STO film grew in the two dimensional mode. The surface morphology was strongly affected by the oxygen pressure. Both the lattice constant of the a-axis and Nb contents in the Nb-STO films increased as the oxygen pressure decreased, while they were hardly affected by the change in the substrate temperature. Furthermore, the electrical properties of Nb-STO films were also influenced by oxygen pressure and by valence of the Nb ion.
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