Ni–P electroless on nonconductive substrates as metal deposition process for MEMS fabrication

Abstract

During past decades Micro Electro Mechanical Systems (MEMS) have been developed and presented in the market. It is important to find new processes and methods to facilitate MEMS production regarding to growing demand of MEMS devices in IoT, smart and intelligent systems, consumer electronics and medical applications. In this paper, Ni–P layer deposition on insulator substrates is presented. The layer is deposited based on chemical reactions in electroless process. There is a similar method, electroplating, for metal deposition but the substrate must be conductor to transfer electrons and provide essential conditions for electroplating. Electroplating process is not applicable for insulator substrates, while the proposed electroless process can be useful. Different steps, materials, conditions and experimental results for Ni–P electroless are presented. A fabrication process for DC contact RF MEMS switch based on Ni–P electroless is introduced, too. As one advantage of this process, Ni and Ni–P are ferromagnetic material and any suspended structure can be actuated by magnetic fields. It will be beneficial when applying other actuation mechanisms like electrostatic, thermal or piezoelectric are difficult or impossible to be applied.