Abstract
The structure of the deposited alloy film by the electroless plating method changes continuously from crystalline, which is the aggregation of very fine crystals, to amorphous with increasing boron or phosphorous contents in the deposited film. In this investigation, the deposit condition to make the amorphous alloy in the electroless plating bath using dimethylamine borane (DMAB) as a reducing agent was studied. The increase of reducing agent concentration in the plating bath increases the boron content in the deposited film and contributed to make an amorphous film. Furthermore, the decrease of pH and the increase of temperature of the plating bath also had the same effect. The added other agent for reduction of internal stress in the deposited film and to stabilize the pH of the plating bath did not show any pronounced effect on the concentration of boron in the deposited film. Finally, the Ni-B alloy film prepared in this investigation contained a maximum amount of 16.2 at%B and showed an amorphous-like structure with a small amount of fine nickel crystals.
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