New X-ray diffraction method for materials science

Abstract

A new and very promising X-ray diffraction method for the texture and internal stress investigation is described. This method, based on the conventional pole figure measurements in the back-reflection technique, affords possibilities for investigations of the diffraction effects due to layers on a given depth in a material. The condition of constant information depth is attained by abandoning the Bragg–Brentano localization geometry, using an appropriate offset angle for each sample tilt angle. During such measurement, after selection of the adequate offset angle, its corresponding change proceeds automatically. In order to obtain satisfactory integrated intensities, a pseudo-position sensitive detection technique is applied. The proposed method in this non-symmetrical mode is both a recommendable and useful tool for studying textured and epitaxial thin films as well as multi-layer systems.