Abstract
Among new technologies applied to obtaining of surface layers from gaseous phase especially remarkable is PVD method in which one of the substrate is vapour. Actually exist many modifications of PVD methods. In their especially interested are this, in which were used a plasma for layers deposition, for example PAPVD (Plasma Assisted PVD) method. In technologies PAPVD the kind and the way of supplying substrates of chemical reaction into the plasma area and the method of producing plasma play a general role. In this paper will be present a possibility of using trimethylaluminium (TMA) – Al(CH3)3 in PAPVD method. The presence of metalorganic precursors lead to decrease process temperature and make possibility to obtain coating with diversified chemical composition.
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