Abstract
This paper presents two new approaches used in the secondary ion mass spectrometry (SIMS) for high sensitivity dopant and impurity analysis in HgCdTe materials, namely, the high mass resolution with dynamic transfer and the MCs+ technique. It is shown that better detection limits for As and Cu can be obtained at a level of 2–5e14 at/cm3. The MCs+ technique has added advantages of better measurement precision, monitoring Cd composition in the same profile, and small device area analysis capability. Advantages and trade-offs of each technique are discussed and compared. An updated detection limit table for all elements measured in HgCdTe materials using SIMS is also presented.
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