New t-BOC blocked polymers for advanced lithographic applications.

Abstract

t-Butyloxycarbonyl (t-BOC) blocked compounds based on the protection of phenolic groups, e.g. poly-4-hydroxystyrene derivatives, Bisphenol A type dissolution inhibitors, or onium salt photoacid generators, have found widespread research interest for photoresist systems with excellent photosensitivity and high resolution power. We have made an extension of this approach using new phenol type polymers. This contribution presents first details on the chemistry of these systems and results of their lithographic evaluation as positive tone photoresists for UV4, UV3 and especially, UV2 applications.