Abstract
The need for large substrate, high-throughput, lithographic tools has led to the development of the MRS 4500 PanelPrinter. This new stepper combines image field stitching technology with a long-travel, air-bearing stage to achieve four micrometer (μm) design rules over a 450 by 450 millimeter substrate. In order to produce sufficient throughput, the PanelPrinter utilizes a novel architecture which employs multiple optical projection systems to create a single, large-area image. This paper presents a description of the PanelPrinter's system architecture and provides performance data to illustrate resolution, image distortion, and overlay performance on large-area images. Special emphasis is given to the on-board metrology systems which provide the stability and precision required to perform large scale lithography.
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