Abstract
We experimentally investigate the feasibility of a realization method for the three-dimensional photonic crystal in the optical wavelength region. Micromachining techniques of dry-etching, wafer-bonding and laser beam diffraction pattern observation techniques are utilized. Each process is investigated using an AlGaAs/GaAs semiconductor system, and the feasibility of this method is successfully demonstrated for a structure having a photonic bandgap in the 10 µm wavelength region.
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