Abstract
Abstract Metal oxide thin films, in particular the multicomponent ones, are being widely used in optoelectronics and other high technological applications. In recent years, several progresses in fabrication of oxide thin films have been made. In this paper, we survey a variety of deposition processes of oxide thin films with emphasis on some new techniques for successful preparation of multi-component ones, illustrate the general trend of the development, and also outline the development of ferroelectric thin films depostion in China.
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