Abstract
We proposed an AC electric field-assisted novel polishing method for borosilicate glass plate with water-based slurry. It has been found that the applied electric field operates effectively in positioning the slurry with abrasives in the polishing area. In-situ observations also confirmed that the AC electric field affected the motion of slurry. Under optimal polishing conditions, the processing time of borosilicate glass plate was shortened compared to AC electric field free conditions. Furthermore, the polishing removal amount was increased from 14 to 22 μm for a polishing time of 30 min. This suggests that the productivity could be enhanced by 1.5 times by applying electric field during polishing.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
