Abstract
The enhanced optical absorption measured by Constant Photocurrent Method (CPM) of hydrogenated nanocrystalline silicon thin films is due mainly to bulk and/or surface light scattering effects. A new numerical method is presented to calculate both true optical absorption and scattering coefficient from CPM absorption spectra of nanotextured nano-crystalline silicon films. Bulk and surface light scattering contributions can be unified through the correlation obtained between the scattering coefficient and surface roughness obtained using our method.
Highlights
In thin films of nanocrystalline silicon (nano-Si):H is measured by Constant Photocurrent Method (CPM)
The enhanced optical absorption measured by Constant Photocurrent Method (CPM) of hydrogenated nanocrystalline silicon thin films is due mainly to bulk and/or surface light scattering effects
In thin films of nano-Si:H is measured by Constant Photocurrent Method (CPM)
Summary
The details of CPM method and its experimental configuration are described elsewhere [6]. This method is developed in order to understand the subgap part of the true optical absorption spectra related to the defect states within the energy gap. It’s introduced with the help of a recent theory [3] which describes the different contributions of light scattering in terms of photocurrent IPh deduced from CPM measurements. This procedure has a crucial importance to determine true in the case of weak bulk light scattering, without need to compare a several CPM measurements (for different interelectrodes spacing) [3]. We will apply this method on a series of nano-Si:H which have a different surface roughness in order to determine the correlation between this material parameter and the scattering coefficient sc
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