Abstract
We report two new effects of negative differential resistance in the modulation-doped AlGaAs/GaAs negative resistance field-effect transistor. Both effects are well controlled by a third electrode. Presence of a top n+ AlGaAs layer causes a hot-electron real-space transfer to this layer, and prevents the electron transfer to the collector. Creation of the high-field domain in the source-drain channel is needed to activate the hot-electron injection to the collector. The real-space transfer to the top n+AlGaAs layer, combined with the quenching of the high-field domain by the collector bias, are responsible for the appearance of the observed new negative differential resistance effects.
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