New Micro- and Nanoelectrode Arrays for Biomedical Applications

Abstract

A very simple fabrication technology for a new electrode array architecture with pyramidal micro- or nano-electrodes (ultramicroelectrodes, or UME) is described in this paper. This technology is based on standard processes used in silicon device fabrication such as: silicon etching, metallic and dielectric film deposition. In order to release the dielectric material from the top of the pyramidal electrode, the photolithographic exposure takes place on the whole silicon surface without photolithographic mask. Different applications of these micro- and nano-electrode array in bio-medical field are presented.