Abstract
Tris(trimethylsilyl) antimonite, (Me3SiO)3Sb was for the first time prepared by the reaction of trimethylsilanol with triethyl antimonite in 67% yield [1]. But the strong tendency of trimethylsilanol to take part in anhydrocondensation resulting in the formation of hexamethyldisiloxane decreased the preparative value of this method. The attempts to prepare tris (trimethylsilyl) antimonite by the reaction of sodium trimethylsilanolate with the antimony trichloride [2] or trimethylsilanol with the antimony triacetate [3] failed. Later tris(trihydrocarbylsilyl) antimonites attracted the attention of many researchers [4–6] and were used as precursors of the antimony silicate glass for coatings in microelectronics [7].
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