Abstract
A new method for patterning the rear contacts on the passivation layers of solar cells using a mechanical scriber has been developed and successfully adapted to fabricate high-efficiency passivated emitter and rear cell (PERC). Three types of rear contact patterns, dot patterns by photolithography, solid line and dashed line patterns using a mechanical scriber have been processed in order to optimize the rear contact structure. An efficiency of 19.42% has been achieved on the mechanically scribed (MS)-PERC solar cell on 0.5 Ωcm, p-type floating-zone silicon (FZ-Si) wafer and is comparable to that of conventional PERC solar cells fabricated by photolithography.
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