Abstract
Abstract In the present work, we propose a new lithography technique combining UV (ultraviolet) exposure with electrohydrodynamic (EHD) printing. How to improve traditional photolithography is still a challenge due to its complex steps and expensive process. EHD printing is a very promising and potential technique for micro- and nano-scale electronic structures manufacture. The newly developed lithography technique enables a reduction of fabrication steps from six to two comparing with traditional photolithography. Based on the home-made EHD printing platform, linear photoresist structures were printed under different printing conditions to analyze the influence of printing parameters on the line width and printing resolution. In addition, we also discussed some phenomena and problems in the printing process, such as different combination of parameters to get different line widths, different printing modes and so on. According to our research, straight lines with line width of 9 μm can be fabricated, demonstrating the feasibility of the developed lithography technique based on EHD printing.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
