Abstract
Highly oriented soft underlayers with face-centered-cubic (fcc) phase Co, Co alloy, and composite NiFe/Co film structures have been epitaxially grown on single crystal Si wafers by sputter deposition. The epitaxial orientation relationships have been determined by x-ray diffraction and transmission electron microscopy. It was found that the soft underlayer magnetic properties can be modified in a wide range by fine tuning the Co alloy composition or the Co alloy thickness in a NiFe/Co structure. Ti films were sputter deposited on top of the NiFe and Co layers and epitaxial growth in both Ti(0001)/Co(111) and Ti(0001)/NiFe(111) was observed. Through this highly oriented Ti intermediate layer, a Co alloy perpendicular media layer with greatly improved hexagonal-close-packed (0001) orientation can be integrated with the highly (111) textured fcc soft magnetic underlayers.
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