New Compositions from Photosensitive Copolymers for Information Processing and Storage

Abstract

In this work we present a number of new compositions from photosensitive copolymers for information processing and storage. A number of donor-acceptor systems from carbazolyl containing polymers, in particular from carbazolyletilmethacrylates (CEM) and oktylmethacrylates (OMA) copolymers sensitized by threenytrofluorenone (TNF) derivates and additives of photochromatic substances from indolynospirobenzpyran row are investigated. The introduction in photoplastical layers 6–10% of the photochromatical additives is increased by photosensitivity of donor-acceptor systems in 5–6 times. The greatest sensitization effect has 8′-nitro-1,3,3-three methylindolynospirobenzpyran. The appreciable sensitization effect is reached at drawing of photoplastical layers on an injection films from chalcogenide glass semiconductors. Developed on the basis of photopolymer CEM:OM donor-acceptor systems have photosensitivity 10−6 J/sm2 at 80–85°C that on 2–3 order is higher than usual systems without injection. From received compositions of photopolymers were obtains photothermoplastical carriers for registration optical information. A detailed experimental study of the kinetics of photodarking and photobleaching in photochromatic polymer films is presented in this work. As a photochromatic polymer films we have obtained photochrom 1,3,3-three methyl-6(8)-nytroindolynospirobenzpyran in butilmethachrylat-styrol copolymer, which were taken in different percentage correlation. On the base of this results were elaborated the information media for holographic image registration with resolution up to 5000 mm−1. In this work we present also the results concerning the possibilities of strengthening of polymer media with the scope to improve mechanical properties of the relief image (hardness, strength, adhesive stability) and the possibilities to make copies by hot stamping method. Layers were prepared from copolymers, which contain chemically active liaisons of 4-aminostyrol or hlycedylmethacrylat. The thermoplastic layers with relief images can be cross-linked under the action of UV-light or under the action of chemical agents. As a result the polymer layers with the relief image become mechanical hard, strength, adhesive stable, without solubility in organic solvents and with stability to high temperature. The second polymer matrix on the 4-aminostyrol and hlycedylmethacrylat thermoplastic layers can be used for the multiplication of the copies on the special thermoplastic material. Carbazolylalcylmethacrylats with oktylmethacrylats copolymers have appeared rather suitable for create of new media for use in quality of photoresist. By us were received, tested and investigated as a photoresists media photopolymer layers from carbazolylalcylmethacrylats with oktylmethacrylats copolymers. On the created photoresists layers from copolymers CEM:OMA the diffraction holographic gratings diffraction efficiency 25% and resolution capability 1500 mm−1 were obtained.