New approaches to metallic nanogap sensors and devices (Conference Presentation)

Abstract

Metallic nanogaps are fundamental components of nanoscale photonic and electronic devices. However, the lack of reproducible, high-yield fabrication methods with nanometric control over the gap-size is hindering practical applications. In this presentation, I will describe a novel technique called adhesion lithography that permits the rapid fabrication of nanogap electrodes, with electrode spacings as low as 3 nm. The procedure—which can be carried out at room temperature under ambient conditions, using simple equipment and only a few processing steps—provides a rapid and well-controlled route to a wide range of nanogap devices. I will describe how the basic technique may be combined with other lithographic methods to create large-area (> 1 cm2) arrays that contain hundreds of millions of size-controlled metallic nanogaps, and will give selected examples of how the resulting arrays may be applied in the fields of molecular electronics, plasmonics and biosensing.