Abstract
Minute columnar and ring patterns are fabricated by heat-mode lithography, in which a mixed thin film consisting of zinc sulfide (ZnS), silicon dioxide (SiO2), and zinc (Zn) is used. This single layer has an optical absorption ability and simultaneously shows etching resistance change. Smooth submicrometer-scale ring arrays are fabricated by a unique two-step method. First, an ablation hole is formed by irradiating pulsed laser light, and then a ring pattern is formed by removing the outer regions by wet etching. Optically transparent patterns are also fabricated using an oxidizable light-absorption material of Zn, which changes to zinc oxide (ZnO) following laser irradiation.
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