Abstract
A facile and effective plasma sputtering method for the preparation of a visible light active photocatalyst - rhombic dodecahedral silver phosphate Ag3PO4 covered with nanographene (Ag3PO4-GR) with improved stability has been developed. Proposed method allows for the usage of readily available materials for nanographene sputtering and for easy scaling-up. The stability improvement, confirmed by visible light-induced phenol degradation experiment, could be attributed to the synergistic effect of the silver phosphate particles and graphene material allowing for migration of metallic silver nanoparticles from semiconductor's surface to graphene body keeping the semiconductors surface “silver free”. Also due to its conductive properties, nanographene may additionally be preventing electron-hole recombination and metallic silver formation.
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