Abstract
AbstractThis article describes progress in the author's laboratory in two new areas of photoresponsive polymers: (1) photochemical control of electrostatics, and (2) conjugated materials with photocleavable pendants. In both cases, incorporation of o‐nitrobenzyl esters (NBEs) imparts this photoreactivity. NBE‐derivatized, ring‐opening metathesis polymerization (ROMP)‐derived polycations form positive photoresist layer‐by‐layer (LbL) films that dissolve in base upon irradiation. NBE‐derivatized conjugated oligomers show photoactivated fluorescence, whereas NBE‐substituted polythiophenes are negative photoresists due to photolysis of solubilizing alkyl chains.
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