Abstract
Thin-film interferometry has long been used to monitor deposition and etching processes. The authors present Lissajous and phase-space graphs of thin-film interferometry traces and discuss some of the practical implications of graphing the data in these nontraditional formats. These types of graphs can highlight certain process events and provide a more user-friendly operator interface for the control of thin-film etching and deposition processes. >
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
