Abstract
The effect of neutron irradiation on 4H SiC epitaxial layers are studied. Several different doses of both fast and thermal neutrons have been used and the samples have been annealed from 500 degreesC to 2000 degreesC. The defect concentration dependence on the fast neutron flux and on the annealing temperature is investigated. At temperatures from 900 degreesC to 1300 degreesC new lines between 3960 Angstrom and 4270 Angstrom appear. They are similar in behavior to the E-A and D1 spectra and are assumed to be related to excitons bound to isoelectronic centers. After annealing at 2000 degreesC another new line appears at 3809 Angstrom. The similarity of this line with phosphorus in 6H makes us tentatively ascribe it to phosphorus.
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