Neutral Mechanical Plane Shifting in Bending Elastomer Film Revealed by Quantification of Internal Strain

Abstract

Neutral mechanical plane (NMP) position of a bending elastomer film is experimentally identified by internal strain analysis utilizing reflection of a cholesteric liquid crystal elastomer sensor as described in article number 2101041 by Atsushi Shishido, Norihisa Akamatsu and co-workers. The internal strain analysis revealed NMP shifting during elastic bending. Quantification of the NMP shifting in the bending elastomer film enables us to design a flexible electronic device that exhibits high mechanical durability.