Abstract
The negative capacitance (NC) Ge pFETs with different thicknesses of HfZrOx (HZO) are investigated. Although NC transistors with 6.6 nm HZO exhibit a 56 mV/decade subthreshold swing, the hysteresis inevitably occurs. The hysteresis-free characteristics are demonstrated in NC Ge pFETs with 4.5 and 3.7 nm HZO. We also study the impact of annealing temperature on the electrical performance of devices, which shows that the hysteresis reduces with the increasing of annealing temperature. By tuning the parameters of HZO, the NC devices achieve better SS and on-current in comparison with the control transistors.
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