Abstract
Near-infrared (NIR) organic photodetectors with high detectivity are fabricated with an organic electron blocking layer (EBL) with an appropriate energy band alignment. To avoid damage to a preceding organic electron blocking layer during a subsequent coating of an organic photoactive layer, cross-linking technology using a novel photoinitiator is used for an EBL. Poly-TPD is used as an EBL due to its appropriate energy band alignment with an NIR organic sensitizing layer. A ternary blend film composed of PTB7-Th, COi8DFIC, and PC71BM are used as a NIR sensitizing layer with strong photosensitivity in multi-spectral (UV-Visible-NIR) wavelengths of 300-1,000 nm.
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