Abstract
Near-zero magnetostriction permalloy films, 3000A thick, were made by ion beam sputtering with a Ni 80 Fe 20 target. The placing of a Ni strip onto the target and N 2 addition were used to independently adjust the film composition and crystalline texture respectively. Film composition and crystalline texture were investigated using X-ray fluorescence and diffraction. A change of the magnetostriction constant λ expressed in terms of ΔH k , obtained by straining the film, was also observed after a 250°C easy axis annealing in a vacuum oven. We suggest that this change may be related to an observed change in microstructure of the NiFe for low and a reduction of the I 200 /I 111 X-ray peak intensity ratio for high N 2 partial pressures.
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