Abstract
The damaged layer in Zn implanted n-type CZ-Si(100) substrates was investigated by a secondary ion mass-spectrometry (SIMS), an X-ray diffraction (XRD) and an atomic force microscopy (AFM). The substrates were implanted with 64Zn+ ions at an energy of 100keV and an ion dose of 2×1016cm−2 with subsequent annealing at 400, 600, 700, 800, 900 and 1000°C for 60min in neutral/inert and oxygen atmosphere. A significant redistribution of Zn atoms in the damaged layer caused by the thermal annealing was found by SIMS. Zn concentration maximum exceeds a Zn solubility limit in Si; therefore, a decomposition of Zn solid solution in Si resulting in formation of zinc-containing phases in the surface layer should be expected. In an as-implanted state, the amorphous layer with thickness about 100nm, which located inside of a substrate on the depth more than value Rp, is formed. After thermal annealing at 800°C nanoparticles on the sample surface were revealed. After 1000°C annealing the radiation-induced defects completely disappeared, and Zn implanted atoms are revealed in the near surface layer.
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