Abstract
The traps situated in the oxide in the vicinity of the Si–SiO2 interface in metal-oxide-semiconductor (MOS) transistors, are studied. This is achieved using a new technique, based on the measurement of drain current transients and called T-CDLTS (tunnel-current deep level transient spectroscopy). For this, the traps are repeatedly filled with majority carriers using gate pulses which bias the device in accumulation. Each time the device returns in inversion, the drain current transient induced by the filling of the traps with minority carriers is monitored. A model for extracting the interface trap depth concentration profiles from the current transients is derived. It is based on Shockley–Read–Hall’s statistics [R. N. Hall, Phys. Rev. 87, 387 (1952), W. Shockley and W. T. Read, Phys. Rev. 87, 835 (1952)] and on the Heiman and Warfield tunneling model [F. P. Heiman and G. Warfield, IEEE Trans. Electron Devices ED-12, 167 (1965)]. The slow trap densities measured in a virgin device agree with those obtained in state-of-the-art MOS transistors using noise measurements. In virgin and stressed devices they also compare favorably with the trap densities obtained using a recently proposed charge pumping technique. The evolution, with the experimental conditions, of the trap concentrations measured is discussed with respect to that expected from the model. In some experimental conditions, a very good agreement is obtained while in some others, discrepancies are observed. These discrepancies are discussed as regard to the hypothesis introduced in the model.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.